We have several nanolithography systems capable of nanolithography, each with specific advantages.

Our nanoimprint lithography system is an EVG 620 Semi-automated Nano-Imprint Lithography System with SmartNIL(TM) tooling for UV-nanoimprint processes. It is capable of imprinting areas from 10x10 mm up to 150 mm diameter with a guaranteed resolution down to 50 nm. Replication is via intermediate soft stamps so is suitable for easy replication from rigid masters, e.g. Si wafers, mask plates etc.

Our displacement Talbot lithography system is the PhableR 100M system from EULITHA AG. It is capable of the non-contact, submicron patterning of periodic patterns on areas up to 100 mm diameter.

The theoretical resolution limit is a periodic pitch of approximately 200 nm, but the guaranteed pitch is 300 nm. The maximum pitch is approx. 4 microns.

High-aspect ratio resist features are achievable and the machine also has an alignment capability.