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Micro-scale lithography

The David Bullett Nanofabrication Facility houses different photolithography tools that are available for internal and external users.


Person using the direct laser writer
Performing microscale lithography using our direct laser writer

Mask-based optical lithography is centred around a Karl Süss MJB3 UV contact mask aligner configured for top side alignment and capable of registration and printing of designs with resolution down to 1 μm. Thin and thick resist materials can be exposed on substrates up to 75 mm in diameter, using masks up to 100 mm x 100 mm in size.

Alternatively, maskless lithography can be performed with a Heidelberg Instruments μPG 101 Direct Laser Writer Lithography System capable of sub-micron patterning. The system includes a 375 nm laser source for exposure of standard and UV resists such as SU-8. Samples to be patterned can be up to 125 x 125 mm². Vector and raster exposure modes are available, and there is also a 3D exposure mode.

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